Applied Enhancements

Applied Enhancements 1.0.9

English

• Fixed Quick Pattern Move coordinate handling after the Pattern Access terminal toolbar is expanded. Right-click cut, empty-slot paste, selection hit testing, and selection highlights now use the same 18-pixel slot offset.
• Fixed intermittent cases where a selected pattern or an empty target slot could not be found by the context menu.
• Kept AELIS planning diagnostics behind the existing diagnostics setting and rate limiter. High-cost candidate and no-progress messages no longer enter the normal log stream.
• Kept compatibility errors and recovery failures visible while removing routine planning progress output from normal logs.
• Retained the JEI 19.27–19.56 injection compatibility fix by capturing version-dependent factory arguments through MixinExtras.

中文

• 修复样板访问终端扩展工具栏后快速移动坐标错位的问题。右键剪切、空槽粘贴、选中判定和选中高亮现在统一使用 18 像素的样板槽偏移。
• 修复右键选中的样板或空目标槽偶尔无法被菜单识别的问题。
• AELIS 规划诊断继续受现有诊断开关和限流器控制，高成本候选及无进度提示不再进入普通日志。
• 兼容性错误和恢复失败仍会保留，常规规划过程提示已从普通日志中移除。
• 保留 JEI 19.27–19.56 的注入兼容修复，通过 MixinExtras 捕获不同版本的工厂参数。